APA
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Pang, J., Mendes, R. G., Wrobel, P. S., Wlodarski, M. D., Ta, H. Q., Zhao, L., … Rümmeli, M. H. (2017). Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO <sub>x</sub> by Chemical Vapor Deposition. ACS Nano, 11(2), 1946–1956. https://doi.org/10.1021/acsnano.6b08069
Chicago/Turabian
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Pang, Jinbo, Rafael G. Mendes, Pawel S. Wrobel, Michal D. Wlodarski, Huy Quang Ta, Liang Zhao, Lars Giebeler, et al. “Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO ≪Sub≫x≪/Sub≫ by Chemical Vapor Deposition.” ACS Nano 11, no. 2 (February 2017): 1946–1956.
MLA
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Pang, Jinbo, et al. “Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO ≪Sub≫x≪/Sub≫ by Chemical Vapor Deposition.” ACS Nano, vol. 11, no. 2, Feb. 2017, pp. 1946–56, doi:10.1021/acsnano.6b08069.
BibTeX Click to copy
@article{pang2017a,
title = {Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiO <sub>x</sub> by Chemical Vapor Deposition},
year = {2017},
month = feb,
issue = {2},
journal = {ACS Nano},
pages = {1946-1956},
volume = {11},
doi = {10.1021/acsnano.6b08069},
author = {Pang, Jinbo and Mendes, Rafael G. and Wrobel, Pawel S. and Wlodarski, Michal D. and Ta, Huy Quang and Zhao, Liang and Giebeler, Lars and Trzebicka, Barbara and Gemming, Thomas and Fu, Lei and Liu, Zhongfan and Eckert, Juergen and Bachmatiuk, Alicja and Rümmeli, Mark H.},
month_numeric = {2}
}